tender for photoresist az 15 nxt 115 cps , photoresist az 15 nxt 450 cps , developer az 351 b , developer az 2026 mif , photoresist az 10 xt 520 cp , photoresist az n lof 2035 , developer az 300 mif az n lof developer , technistrip ni555 , technistrip p1316 , hydrochloric acid 37 persent conc acs grade , hydrofluoric acid 40 persent conc analysis grade , conc. sulfuric acid 95-98 persent conc , hydrogen peroxide 30persent conc. , ammonium hydroxide 28-30 persent conc. , sylgard 184 silicone elastometer kit , pentacene 99 persent or above , si wafer - diameter 100 mm , si wafer - diameter 50.8 mm, consumables and chemicals for temperature sensor fabrication, photoresist az 15 nxt 115 cps 500 ml, photoresist az 15 nxt 450 cps 500 ml, developer az 351 b 5 l, developer az 2026 mif 5 l, photoresist az 10 xt 520 cp 500 ml, photoresist az n lof 2035 250 ml, developer az 300 mif az n lof developer 5 l, technistrip ni555 5 l, technistrip p1316 5 l, hydrochloric acid 37% conc acs grade 2500 ml, hydrofluoric acid 40% conc, analysis grade 2500 ml, conc. sulfuric acid 95-98% conc., acs reagent 1 l, hydrogen peroxide 30% conc. 1 l, ammonium hydroxide 28-30% conc. 1 l, sylgard 184 silicone elastometer kit 10 gm, pentacene 99% or above 5 gm, si wafer - diameter 100 mm, si wafer - diameter 50.8 mm